Method of fabricating a photomask

摘要

A method of fabricating a photomaskautomatically generates a microscopic supplementary pattern by selective sizing to reduce a product cost and by which a precise line width is provided in a manner of decreasing unnecessary microscopic supplementary patterns to raise precision of a photomask pattern. The method includes the steps of selectively carrying out a sizing on a main pattern to form a microscopic supplementary pattern with a difference of the corresponding sizing and selectively removing the microscopic supplementary pattern.