发明名称 PROJECTION OPTICAL SYSTEM AND EXPOSURE DEVICE EQUIPPED WITH THE PROJECTION OPTICAL SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a reflection-type projection optical system which is equipped with a reflector having an aspherical reflecting surface, capable of employing a spherical surface correction processing method and can conduct aberration correction, while suppressing increase in the size of the reflector. <P>SOLUTION: This system is equipped with a 1st reflective imaging optical system (G1) for forming an intermediate image of a 1st surface (4) and a 2nd reflective imaging optical system (G2) for forming an image of the intermediate image on a 2nd surface (7). The 1st reflective imaging optical system has a 1st reflector M1, an aperture stop, a 2nd reflector M2, a 3rd reflector M3, and a 4th reflector M4, in the order of the incidence of light from the 1st surface side. The 2nd reflective imaging optical system has a 5th reflector M5 and a 6th reflector M6, in the order of the incidence of light from the 1st surface side. The reflecting surface of the 2nd reflector M2 and the reflecting surface of the 4th reflector M4 are formed aspherical to be 0.6μm or lower in sagging quantity. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005172988(A) 申请公布日期 2005.06.30
申请号 JP20030410098 申请日期 2003.12.09
申请人 NIKON CORP 发明人 TAKAHASHI TOMOWAKI
分类号 G02B17/00;G03F7/20;G03F7/22;H01L21/027;(IPC1-7):G02B17/00 主分类号 G02B17/00
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