| 摘要 |
PROBLEM TO BE SOLVED: To provide a device manufacturing method having high availability and/or productivity, in which moisture is reduced in an atmosphere within a chamber of an exposure device. SOLUTION: A device manufacturing method comprises step for providing a substrate W, providing a projection beam of radiation PB using an illumination system IL, using a patterning means MA to impart the projection beam PB with a pattern in its cross-section, and projecting the patterned beam of radiation PB to a target portion of the substrate W. In the method, at least part of the method is carried out in at least one of chambers 1, 5 and 6, and at least one chemical reagent is supplied to the chambers 1, 5 and 6 for removing water from the chambers 1, 5 and 6. COPYRIGHT: (C)2005,JPO&NCIPI
|
