发明名称 |
Method for position determination, method for overlay optimization, and lithographic projection apparatus |
摘要 |
A method for optimizing an alignment condition of a lithographic projection apparatus. This method comprises projecting a beam of radiation on a target portion of a substrate and measuring a plurality of diffracted signals emitted by the target portion. This method further comprises calculating a variance for each of the plurality of diffracted signals, such that a plurality of variances of the diffracted signals is determined, and adjusting the alignment condition of the lithographic projection apparatus based on analysis of the plurality of variances.
|
申请公布号 |
US2005133743(A1) |
申请公布日期 |
2005.06.23 |
申请号 |
US20030736911 |
申请日期 |
2003.12.17 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SCHETS SICCO I.;HUIJBREGSTSE JEROEN;DUNBAR ALLAN R.;VAN DER AA NICOLAAS P. |
分类号 |
G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G01N21/86 |
主分类号 |
G01B11/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|