发明名称 Projection optical system, exposure apparatus and exposure method
摘要 Disclosed is a projection optical system having relatively large image-side numerical aperture and projection field and being excellent in mechanical stability in respect of vibrations, and the like. The projection optical system includes a first image-forming optical system for forming a first intermediate image of a first surface (R), a second image-forming optical system having a concave reflective mirror and for forming a second intermediate image based on a radiation beam from the first intermediate image, and a third image-forming optical system for forming a final image on a second surface based on a radiation beam from the second intermediate image. Then, predetermined conditional expressions are satisfied with regard to a clear aperture diameter of the concave reflective mirror, a distance (L) between the first surface and the second surface, and a distance (H) between the concave reflective mirror and a reference optical axis.
申请公布号 US6909492(B2) 申请公布日期 2005.06.21
申请号 US20030412258 申请日期 2003.04.14
申请人 NIKON CORPORATION 发明人 OMURA YASUHIRO
分类号 G02B17/08;G02B13/18;G02B27/18;G03B21/00;G03F7/20;H01L21/027;(IPC1-7):G03B27/54;G03B27/42 主分类号 G02B17/08
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