| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin-film-forming apparatus for forming such an optical thin film as to have thickness as aimed on a product substrate, and to provide a method for forming the optical thin film. SOLUTION: The thin-film-forming apparatus 1 for forming the optical thin film 3 on the product substrate 5 (the substrate) which is arranged in a vacuum chamber 2 and will become a product after having had the optical thin film 3 formed thereon comprises: two vaporizing sources 7 and 8 which are arranged in the bottom side of the vacuum chamber 2 and at decentered positions so as to face the product substrate 5; a spherical dome 10 (a substrate support) which is arranged in the upper side of a vacuum chamber 2 and passes over the vaporizing sources 7 and 8 while supporting the product substrate 5; shutters 11 and 12 which are arranged right above each of the vaporizing sources 7 and 8, and shield a space between the vaporizing sources 7 and 8 and the spherical dome 10; a characteristics-evaluating means 13 for measuring the optical characteristic values of the optical thin film 3 formed on the product substrate 5; and a thickness-controlling system 15 for controlling the film thickness. COPYRIGHT: (C)2005,JPO&NCIPI
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