发明名称 ETCHING PROCESSING METHOD FOR METAL SURFACE
摘要 PROBLEM TO BE SOLVED: To provide a metal surface etching processing method by which only a portion required to be confirmed can be surely observed.SOLUTION: Etching liquid-containing filter paper 13 to be a base material containing an etching liquid is stuck to an observation surface 12 of a metal test piece 11, and while rolling a roller 14 along the surface of the stuck etching liquid-containing filter paper 13, the etching liquid is uniformly applied to the observation surface 12 to form an etching observation surface. Consequently, only a portion required to be confirmed can be surely etched.
申请公布号 JP2013134146(A) 申请公布日期 2013.07.08
申请号 JP20110284502 申请日期 2011.12.26
申请人 MITSUBISHI HEAVY IND LTD 发明人 SHIRANE TAKAHIRO;TSUKAHARA CHISATO;SHUTO SHINGO;ONISHI TOSHIYUKI
分类号 G01N1/32;C23F1/00 主分类号 G01N1/32
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