MASKING MECHANISM FOR FILM-FORMING DEVICE

摘要

A masking mechanism for a film forming device, comprising a mask (11) having a first signal acting edge (11a), a second signal acting edge (11b), and a third signal acting edge (11c) and a drive device for moving the mask (11) in a uniaxial direction (A) relative to a substrate (12), wherein three-component thin-films having film thickness gradient directions equally spaced by 120 ° are overlapped on each other by depositing deposited substances for the edges in a same substrate area while the mask (11) is being moved at a specified speed in the uniaxial direction (A) to form a thin-film (13) with a ternary phase diagram.