发明名称 Electrolytic plating method and device for a wiring board
摘要 A plating bath which accommodates an insoluble node and a printed-circuit board, and a copper dissolved bath which supplies copper ions are arranged. The insoluble anode Is arranged as opposed to the printed-circuit board being a cathode, and a forward/reverse current is applied between both of the electrodes. Iron ions are added to a plating solution.
申请公布号 US2005121314(A1) 申请公布日期 2005.06.09
申请号 US20040896488 申请日期 2004.07.22
申请人 KABUSHIKI KAISHA TOYODA JIDOSHOKKI SEISAKUSHO 发明人 INOUE TOSHIKI;KUMAGAI KYOKO
分类号 C25D3/38;C25D5/18;C25D7/00;C25D21/14;H05K3/18;H05K3/42;H05K3/46;(IPC1-7):C25D17/00 主分类号 C25D3/38
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