METHOD FOR ANALYSING OBJECTS IN MICROLITHOGRAPHY

摘要

The invention relates to a method for analysing objects in microlithography, preferably masks with the aid of aerial image measurement systems (AIMS) comprising at least two imaging stages wherein a detected image is corrected by means of a correction filter with respect to the dynamic systems behaviour of a second imaging stage or another imaging stage, the lighting of the object being carried out by incident and/or transmitted light. The resulted correction is such that corrected output quantities correspond to the image of a photolithography stepper or scanner, said correction being made by reconvolution and the measured correction values being taken into account for the correction.