| 摘要 |
<p>A cryopump (20) used in a process chamber (10) allowing a process gas to flow therein, comprising a 1st stage panel, a heat shield plate (24), and a 2nd stage panel (28). A cutout for enabling the inflow of gas molecules into the pump and an additional shield (34) for preventing the entry of heat by radiation from a cryopump container under room temperature are provided to the heat shield plate (24) to prevent the performance of the cryopump from being lowered by the process gas invading between the cryopump container and the heat shield plate.</p> |
