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发明名称
Verfahren zum Herstellen einer Halbleiterstruktur unter Verwendung einer Schutzschicht
摘要
申请公布号
DE50202891(D1)
申请公布日期
2005.06.02
申请号
DE20025002891
申请日期
2002.08.19
申请人
INFINEON TECHNOLOGIES AG
发明人
HOLZ, DR.
分类号
H01L21/3105;H01L21/768;(IPC1-7):H01L21/768;H01L21/310
主分类号
H01L21/3105
代理机构
代理人
主权项
地址
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