发明名称 |
Method and system for measuring stray light |
摘要 |
A method and system for measuring stray light for use in an exposure apparatus uses an image sensor to be disposed at a wafer level in the exposure apparatus. The stray light is measured by preparing a reference pattern and a measuring pattern on a reticle. The reference pattern includes a light shielding region having first open regions for transmitting light to a center of an active region of the image sensor. The measuring pattern includes a light shielding region having second open regions for transmitting light to a periphery of the active region. A first intensity of light reaching the active region after being filtered by the reference pattern and a second intensity of light reaching the image sensor after being filtered by the measuring pattern are measured. The intensity of the stray light is evaluated by a difference between the first and second light intensities.
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申请公布号 |
US6900887(B2) |
申请公布日期 |
2005.05.31 |
申请号 |
US20040921164 |
申请日期 |
2004.08.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM HO-CHUL |
分类号 |
H01L21/027;G03F7/20;G03F9/00;(IPC1-7):G01J1/42 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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