SELECTIVE ETCH AND CLEANING CHEMISTRIES, METHODS OF PRODUCTION AND USES THEREOF

摘要

An etching and/or cleaning solution includes: a) at least one fluorine-based salt constituent, b) a non-polar solvent constituent in an aqueous environment, wherein the solution constituents are at a suitable concentration to etch polymer-based residues from a surface without reacting with metals, metal-based compositions and silicon-based compositions. Another contemplated etching solution comprises a) at least one fluorine-based salt constituent, b) a compatible solvent constituent in an non-aqueous environment, wherein the solution constituents are at a suitable concentration to etch polymer-based residues from a surface without reacting with metals, metal-based compositions and silicon-based compositions. A method of forming an etching and/or cleaning solution includes: a) providing at least one fluorine-based salt constituent; b) providing a non-polar solvent constituent; c) blending the fluorine-based salt constituent and the non-polar solvent constituent in an aqueous environment to form a solution, wherein the solution constituents are at a suitable concentration to etch polymer-based residues from a surface without reacting with metals, metal-based compositions and silicon-based compositions. Another contemplated method of forming an etching solution comprises a) providing at least one fluorine-based salt constituent; b) providing a compatible solvent constituent; c) blending the fluorine-based salt constituent and the compatible solvent constituent in an non-aqueous environment to form a solution, wherein the solution constituents are at a suitable concentration to etch polymer-based residues from a surface without reacting with metals, metal-based compositions and silicon-based compositions.