| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a film excellent in ink repellency, its retentivity, ink dropping property and its retentivity, and capable of forming a fine pattern. <P>SOLUTION: The photosensitive resin composition contains a silicon-containing resin (A) which is a copolymer including a monomeric unit based on a monomer (a) having a polysiloxane structure and a monomeric unit based on a monomer (b) having a carboxyl group and has an acid number of 5-150 mgKOH/g and a weight average molecular weight of 1,000-20,000, a photoacid generator (B) and an acid crosslinking agent (C) which is a compound having two or more groups capable of reacting with carboxyl groups. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
