| 摘要 |
PROBLEM TO BE SOLVED: To provide a good-quality ITO multilayer film endowed with low resistance and low membrane stress and to provide its manufacturing method. SOLUTION: The manufacturing method of the ITO multilayer film comprises a process of forming a first ITO film on an upper part of a plastic body at a base plate temperature of 20 to 120°C with the use of an ion plating method, and a process of forming a second ITO film on the first ITO film at a base plate temperature of 150 to 250°C with the use of the ion plating method. Since the first ITO film has the low membrane stress and the second ITO film has the low resistance, a good-quality ITO multilayer film endowed with the low resistance and the low membrane stress as a whole is formed. COPYRIGHT: (C)2005,JPO&NCIPI
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