发明名称 |
METHOD FOR DEPOSITING MATERIALS ON A SUBSTRATE |
摘要 |
<p>A method and apparatus for depositing a TERA film having tunable optical and etch resistant properties on a substrate using a plasma-enhanced chemical vapor deposition process, wherein for at least a part of the deposition of the TERA film, the plasma-enhanced chemical vapor deposition process employs a precursor that reduces reaction with a photoresist. The apparatus includes a chamber having an upper electrode coupled to a first RF source and a substrate holder coupled to a second RF source; and a showerhead for providing multiple process and precursor gasses.</p> |
申请公布号 |
WO2005048329(A1) |
申请公布日期 |
2005.05.26 |
申请号 |
WO2004US33865 |
申请日期 |
2004.10.15 |
申请人 |
TOKYO ELECTRON LIMITED;INTERNATIONAL BUSINESS MACHINES CORPORATION;FUKIAGE, NORIAKI;BABICH, KATHERINA |
发明人 |
FUKIAGE, NORIAKI;BABICH, KATHERINA |
分类号 |
H01L21/027;H01L21/033;(IPC1-7):H01L21/033 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|