| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner, which corrects the irrotational symmetric property of the optical characteristics of a lens that accompanies a thermal change in the lens due to the absorption of exposure light by an aligner using a step-and scan system and can obtain a high-resolution pattern image, and to provide a method of manufacturing a device using the projection aligner. SOLUTION: A projection aligner has a means for illuminating a first body with slit-like light, a projection optical system for projecting the pattern of the first body illuminated with the slit-like light on a second body via a lens, a means for scanning the first and second bodies on the slit-like light and the projection optical system and a correcting means for substantially correcting the irrotational symmetric property of the optical characteristics of the lens, which is generated in the projection optical system, by projecting the pattern on the second body with the slit-like light. |
