发明名称 |
Semiconductor device, method of manufacturing the same, circuit board, and electronic instrument |
摘要 |
A wiring pattern is formed over a semiconductor wafer, and an external terminal is formed on the wiring pattern. The wiring pattern extends from a pad which is part of an interconnect to an integrated circuit formed in the semiconductor wafer. A non-resin layer of a non-resin material is formed in a first region of the semiconductor wafer. A resin layer is formed in a second region which is a region of the semiconductor wafer other than the first region by utilizing the non-resin layer. The semiconductor wafer is cut long the first region. |
申请公布号 |
US6897127(B2) |
申请公布日期 |
2005.05.24 |
申请号 |
US20030654449 |
申请日期 |
2003.09.04 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HANAOKA TERUNAO |
分类号 |
H01L23/12;H01L21/301;H01L21/46;H01L21/78;H01L23/31;(IPC1-7):H01L21/46 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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