发明名称 Semiconductor device, method of manufacturing the same, circuit board, and electronic instrument
摘要 A wiring pattern is formed over a semiconductor wafer, and an external terminal is formed on the wiring pattern. The wiring pattern extends from a pad which is part of an interconnect to an integrated circuit formed in the semiconductor wafer. A non-resin layer of a non-resin material is formed in a first region of the semiconductor wafer. A resin layer is formed in a second region which is a region of the semiconductor wafer other than the first region by utilizing the non-resin layer. The semiconductor wafer is cut long the first region.
申请公布号 US6897127(B2) 申请公布日期 2005.05.24
申请号 US20030654449 申请日期 2003.09.04
申请人 SEIKO EPSON CORPORATION 发明人 HANAOKA TERUNAO
分类号 H01L23/12;H01L21/301;H01L21/46;H01L21/78;H01L23/31;(IPC1-7):H01L21/46 主分类号 H01L23/12
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