| 摘要 |
In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m<SUP>2</SUP>, W satisfies a formula W>=2xTx(rho<SUB>sub</SUB>.C<SUB>sub</SUB>.lambda<SUB>sub</SUB>/tau)<SUP>1/2</SUP>, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1x10<SUP>-4 </SUP>Pa to reduce a resistivity of the polymer film to 0.1 Omega.cm, C<SUB>sub </SUB>is a specific heat J/kg.K of the substrate, rho<SUB>sub </SUB>is a specific gravity kg/m<SUP>3 </SUP>of the substrate, lambda<SUB>sub </SUB>is a heat conductivity W/m.K of the substrate, and tau is an irradiation time in the range of 10<SUP>-9 </SUP>sec to 10 sec.
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