| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To form a contact hole at a low cost although a resolution in a crowded part is assured highly. <P>SOLUTION: A method of forming a contact hole includes a step of exposing and developing a first photosensitive resist film on a substrate by using a photomask having mask patterns disposed periodically in a first direction and a second direction intersecting perpendicularly with the first direction and double lighting, a step of forming a first line and space along the first direction, thereafter a step of forming a second photosensitive region on the substrate, a step of exposing and developing the second photosensitive resist film by using the photomask and the double lighting intersecting perpendicularly with the double illuminating, and a step of forming a second line and space intersecting perpendicularly with the first line and space. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
