ELECTRON BEAM IRRADIATION DEVICE, IRRADIATION METHOD, AND ELECTRON BEAM LITHOGRAPHY SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide an electron beam irradiation device and its method capable of inexpensive and high-throughput irradiation of a heavy current to a large irradiation area, and to provide an inexpensive and high-throughput electron beam lithography system and its method having a maintenance-free system and reduced running cost, and capable of high-resolution drawing compared with hitherto. SOLUTION: An electron emission source 1 has an array formed by a plurality of micro-emitter type electron guns 1a, and a transmission part 16a of an electron flux of an electron beam taking-out window 16 has array arrangement corresponding to the array by the micro-emitter type electron guns 1a by a prescribed relation. COPYRIGHT: (C)2005,JPO&NCIPI