| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holder system and a loading method for enabling effective loading and unloading of a substrate for the processing thereof in a process chamber. SOLUTION: The circumference of a wafer support preferably extends continuously and completely over the range of 360°, and the size thereof is determined so that it fits between the projections for supporting a specific wafer within a wafer cassette. An end effector removes the wafer support from a wafer boat and moves the wafer support into the wafer cassette, and the end effector moves upward to place the wafer on the wafer support in the wafer cassette. Then, the wafer and the wafer support are transferred to the wafer boat. The wafer and the wafer support are lowered onto the wafer slot surface within a wafer slot in the wafer boat to transfer the wafer and the wafer support to the wafer boat from the end effector. COPYRIGHT: (C)2005,JPO&NCIPI
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