2-STAGE ArF EXCIMER LASER FOR EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide a high output 2-stage ArF excimer laser for exposure exhibiting good laser beam quality, e.g. pulse energy stability or wavelength stability between laser pulses, in which spectral linewidth is super-narrowbanded to less than 0.25 pm by reducing the influence of an acoustic wave. SOLUTION: The 2-stage ArF excimer laser for exposure operating at an oscillation frequency of 4 kHz or above comprises an oscillation laser 100 having an oscillation chamber 10 encapsulating first laser gas containing F2gas, Ar gas and first buffer gas, and an amplifier 300 having an amplification chamber 30 encapsulating second laser gas containing F2gas, Ar gas and second buffer gas and amplifying a laser beam emitted from the oscillation laser 100. The first buffer gas is He gas or a mixture gas of He gas and Ne gas, and the second buffer gas is composed of Ne gas. COPYRIGHT: (C)2005,JPO&NCIPI