| 发明名称 |
UV CURABLE POWDER SUITABLE FOR USE AS PHOTORESIST |
| 摘要 |
The invention relates to a radiation curable powder photoresist composition comprising the components A a polymer, B a reactive compound having compound having unsaturated groups and C a free radical photoinitiator, wherein the powder photoresist composition is soluble in a developer and wherein the powder photoresist composition has a Tg between 40° and 120°C.
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| 申请公布号 |
KR20050042008(A) |
申请公布日期 |
2005.05.04 |
| 申请号 |
KR20047006315 |
申请日期 |
2004.04.28 |
| 申请人 |
DSM IP ASSETS B.V. |
发明人 |
BINDA, PAUL HERMAN GUILLAUME;MISEV, TOSKO ALEXANDAR;VANDENBERGJETHS, ROBERT;BRATSLAVSKY, SVETLANA ALEXANDRA;SCHMID, STEVEN ROBERT |
| 分类号 |
G03F7/004;G03F7/027;G03F7/031;G03F7/032;G03F7/033;G03F7/035;G03F7/16;G03F7/32;H05K3/00;H05K3/06;(IPC1-7):G03F7/027 |
主分类号 |
G03F7/004 |
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