发明名称 PLASMA POTENTIAL MEASURING PROBE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma potential measuring probe which can evenly generate a local high frequency electric field around an ionic current detecting inner electrode. <P>SOLUTION: The plasma potential measuring probe includes a one-side electrode formed of a cylinder 17 for applying a high frequency, an opposite side electrode for applying the high frequency facing the end face of the cylinder 17 while keeping a gap from the end of the cylinder 17, a floating potential detecting electrode 2, and an ionic current detecting inner electrode 2a arranged in a space which is surrounded by these both side electrodes for applying the high frequency. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005116189(A) 申请公布日期 2005.04.28
申请号 JP20030344721 申请日期 2003.10.02
申请人 HITACHI CABLE LTD;SATO NAOYUKI 发明人 CHO KIN;SATO NAOYUKI
分类号 G01R1/06;H05H1/00 主分类号 G01R1/06
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