发明名称 Wafer dividing method
摘要 A method of dividing a wafer along predetermined dividing lines, comprising the steps of a deteriorated layer forming step for applying a pulse laser beam capable of passing through the wafer along the dividing lines to form deteriorated layers in the inside of the wafer along the dividing lines; an extensible protective tape affixing step for affixing an extensible protective tape to one side of the wafer before or after the deteriorated layer forming step; and a dividing step for dividing the wafer along the deteriorated layers by expanding the protective tape affixed to the wafer after the deteriorated layer forming step.
申请公布号 US2005090077(A1) 申请公布日期 2005.04.28
申请号 US20040968100 申请日期 2004.10.20
申请人 NAGAI YUSUKE;NAKAMURA MASURU;KOBAYASHI SATOSHI;MORISHIGE YUKIO 发明人 NAGAI YUSUKE;NAKAMURA MASURU;KOBAYASHI SATOSHI;MORISHIGE YUKIO
分类号 B23K26/00;B23K26/40;B23K101/40;B28D5/00;H01L21/301;H01L21/304;H01L21/78;(IPC1-7):H01L21/301;H01L21/46 主分类号 B23K26/00
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