| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having high sensitivity, high resolution, rectangular profile, a small particle initial value and excellent curvature reproducibility, and to provide a pattern forming method using the same. <P>SOLUTION: The positive resist composition comprises (A) a resin having solubility in an alkali developing solution increased by the action of an acid, (B-1) a triarylsulfonium salt which includes a fluorine atom in a cationic moiety and generates an aliphatic or aromatic sulfonic acid having a fluorine atom upon irradiation with an actinic ray or radiation, (C) a nitrogen-containing basic compound and (D) an organic solvent. The pattern forming method uses the same. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
