发明名称 COMPOSITION FOR HOLOGRAM RECORDING MATERIAL, RELIEF HOLOGRAM AND METHOD FOR PRODUCING HOLOGRAM
摘要 PROBLEM TO BE SOLVED: To provide a composition for a hologram recording material capable of forming a hardened film excellent in heat resistance, scuffing and wear resistances and having good adhesion to a metal vapor-deposited film and another resin layer, and capable of contributing to an improvement in hologram productivity, and to provide a hologram recording material stably producible with high productivity, a relief hologram and a method for producing a hologram. SOLUTION: The composition for a hologram recording material comprises (A-1) 20-90 wt.% of a resin having a (meth)acryloyl group and (B) 10-80 wt.% of colloidal silica having a primary particle diameter of 1-200 nm. Such a composition for a hologram recording material is also provided which comprises (A-2) a resin having an alkoxysilyl group and a (meth)acryloyl group and an organic-inorganic complex obtained by hydrolyzing and condensing colloidal silica and/or a silicate. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005115264(A) 申请公布日期 2005.04.28
申请号 JP20030352469 申请日期 2003.10.10
申请人 MITSUBISHI CHEMICALS CORP 发明人 KUSAKA HIROSHI
分类号 G03F7/004;G03F7/027;G03F7/038;G03H1/02;(IPC1-7):G03H1/02 主分类号 G03F7/004
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