发明名称 RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE
摘要 <p>A radiation-curing composition is disclosed which contains (a) a siloxane resin, (b) a photoacid generating agent or a photobase generating agent, and (c) a solvent which dissolves the component (a) and contains a non-protic solvent.</p>
申请公布号 WO2005036269(A1) 申请公布日期 2005.04.21
申请号 WO2004JP14850 申请日期 2004.10.07
申请人 HITACHI CHEMICAL CO., LTD.;SAKURAI, HARUAKI;ABE, KOUICHI 发明人 SAKURAI, HARUAKI;ABE, KOUICHI
分类号 C08G77/04;C08L83/00;G02B6/12;G03F7/004;G03F7/038;G03F7/075;H01L21/027;(IPC1-7):G03F7/075 主分类号 C08G77/04
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