PHOTOSENSITIVE POLYFUNCTIONAL COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION AND ARTICLE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To improve the compatibility with other components and a fixing ability of a photoradical generating site in a matrix after curing for a compound having a non-degradable photoradical generating site and an ethylenically unsaturated group in combination.

SOLUTION: The photosensitive polyfunctional compound provided is a photosensitive polyfunctional compound (1a) or (1b) [represented by formula (1a) or formula (1b)] composed of a compound having ≥1 non-degradable photoradical generating sites and ≥2 ethylenically unsaturated groups in one molecule. The compound (1a) has a structure in which the ≥1 non-degradable photoradical generating site A1 and the ≥2 ethylenically unsaturated groups are bound through a ≥3-valent group X1. The compound (1b) has a structure in which the ≥2 ethylenically unsaturated groups are bound through a bivalent group X2 to a ≥2-valent non-degradable photoradical generating site. A naphthalimide group, and the like, are cited as the non-degradable photoradical generating site.

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