Chemical Vapor Deposition Apparatus,申请号KR20020023372-传众专利搜索

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发明名称	Chemical Vapor Deposition Apparatus
摘要
申请公布号	KR100483282(B1)	申请公布日期	2005.04.15
申请号	KR20020023372	申请日期	2002.04.29
申请人		发明人
分类号	H01L21/205;(IPC1-7):H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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