Method and device for the temperature control of surface temperatures of substrates in a CVD reactor,申请号US20030436316-传众专利搜索

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发明名称	Method and device for the temperature control of surface temperatures of substrates in a CVD reactor
摘要	The invention relates to a method for controlling the surface temperatures of substrates arranged on substrate supports borne by a substrate support carrier on dynamic gas cushions in a processing chamber of a CVD-reactor. The aim of the invention is to reduce or adjust the temperature variations. According to the invention, an average surface temperature value is calculated, being measured in a particularly optical manner, and the level of the gas cushions is regulated by varying the individually controlled gas flow producing the gas cushions in such a way that the variations of the measured surface temperatures in relation to the average value lies within a predetermined temperature window.
申请公布号	US6878395(B2)	申请公布日期	2005.04.12
申请号	US20030436316	申请日期	2003.05.12
申请人	AIXTRON AG,	发明人	KAEPPELER JOHANNES
分类号	C23C16/52;C23C16/458;C23C16/46;C30B25/10;C30B25/14;C30B25/16;H01L21/205;(IPC1-7):C23C16/52	主分类号	C23C16/52
代理机构		代理人
主权项
地址

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