| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method. SOLUTION: A lithography apparatus is equipped with a radiation system for providing projection radiation beam, a supporting structure for supporting a patterning means which functions to pattern the cross section of the projection beam, a substrate table for holding a substrate, and a projection system for projecting patterned beam onto a target portion of the substrate. The lithography apparatus also has an infrared source for providing infrared radiation to a measurement band in the lithography apparatus, and a detector that receives infrared radiation, which has come from the infrared source and has passed the measurement band, and outputs a signal indicating the existence of gas in the measurement band. COPYRIGHT: (C)2005,JPO&NCIPI
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