发明名称 PLASMA TYPE GAS TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma type gas treatment device which does not require a direct current power source and on-off semiconductor switch of high breakdown voltage and is capable of efficiently removing a harmful gas component. <P>SOLUTION: Two sets of closed circuits having a capacitor in common are formed of: the direct current power source for charging; the capacitor; a pulse transformer having an intermediate tap on the primary side; and the on-off semiconductor switches which are connected to the respective taps of the divided primary side coil of the transformer. An electric current is selectively controlled by the on-off semiconductor switches, a bipolar pulse voltage is generated on the secondary coil of the boosting pulse transformer, plasma is generated between opposite electrodes, the gas containing a harmful gas is allowed to pass between the electrodes and the harmful gas component is removed. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005087938(A) 申请公布日期 2005.04.07
申请号 JP20030327336 申请日期 2003.09.19
申请人 TOYO ELECTRIC MFG CO LTD 发明人 TANAKA KEITA;OYAMA YUJI
分类号 H05H1/24;B01J19/08;F01N3/08;F01N9/00;H02M7/538;H05H1/46 主分类号 H05H1/24
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