PLASMA PROCESSING DEVICE AND CONTROLLING METHOD THEREFOR

摘要

A detector detects a microwave quantity reflected from a processing container. A load-side impedance is calculated based on a reflected microwave to calculate an adjustment amount required to match it with a microwave oscillator-side impedance. Then, the calculated adjustment amount is multiplied by a specified number of less than one to output it as an adjustment signal. By repeatedly controlling a load matching unit by this adjustment signal, a load-side impedance gradually approaches an oscillator-side impedance to complete a matched condition.