METHOD AND APPARATUS FOR PROCESSING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus capable of processing the surface of a substrate with processing liquid such that the central region on the rear surface of the substrate is not processed. SOLUTION: A not-yet-processed substrate W taken out from a cassette C by means of an indexer robot 22 is transferred from a substrate carrying robot 11 to a substrate reversal mechanism 12 and turned upside down. The reversed substrate W is carried into substrate chemical processing sections 31-34 while directing the surface downward. The processed substrate is transferred to the substrate reversal mechanism 12 by the substrate carrying robot 11 and is turned upside down. The reversed substrate W directing the surface upward is transferred from the substrate carrying robot 11 to the indexer robot 22 and contained in the cassette C. The substrate chemical processing sections 31-34 supply the processing liquid to the substrate W directing the surface downward under horizontal attitude from below and process the circumferential edge part on the lower surface (surface) and upper surface (rear surface) selectively. COPYRIGHT: (C)2005,JPO&NCIPI