| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a solid state imaging apparatus and its manufacturing method easy in mixed color prevention, by improving open sensitivity and making an incidence angle wide. <P>SOLUTION: There are stacked on a photodiode 1 formed on a silicon semiconductor substrate 10 a flattened transparent insulating film 2 comprising BPSG (boron-phosphorous-silicate glass) or the like, an upward convex intralayer lens 3 of high refractive index (n>1.8), a color filter layer 5 composed of a color resist containing dyestuff or pigment, a transparent film 6 comprising an acrylic-based transparent resin, and a microlens (or called a top lens) 7. The color filter 5 is directly attached onto the intralayer lens 3. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
