| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sensor at a substrate height which is suitable for using with a high NA equipment, and has high sensitivity. <P>SOLUTION: A lithographic apparatus comprises: an illumination system configured to condition a radiation beam; a support constructed to support the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and the sensor at substrate level comprising a radiation-receiving element, a transmissive plate supporting said radiation-receiving element, and a radiation-detecting means. In the apparatus, the sensor at a substrate level is arranged to avoid a loss of radiation between said radiation-receiving element and the final element of said radiation-detecting means. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
