| 摘要 |
PROBLEM TO BE SOLVED: To provide a stage system, etc., that can be scanned and positioned highly accurately. SOLUTION: The deformation (the flatness or inclination of the whole body, inclination of a guide mechanism, etc.) of stage guide bases 141 and 171 caused by the offset loads, vibrations, torsion, etc., associated with the movement of a reticle stage main body 137 and a wafer stage main body 167 can be corrected by means of each seat supporting mechanism 131 (sensor-integrated piezo-actuator 143) etc. Therefore, the required accuracy of a stage supporting surface/guide supporting surface can be secured and the deterioration etc., of the scannable properties of the stage main bodies 137 and 167 can be avoided. Consequently, a high throughput can be realized by suppressing the fall of exposure accuracy. COPYRIGHT: (C)2005,JPO&NCIPI |
