| 发明名称 |
EUV reflective mask having a carbon film and a method of making such a mask |
| 摘要 |
An exemplary embodiment relates to a mask for integrated circuit fabrication equipment. The mask includes a multilayer film and an amorphous carbon layer above the multilayer film. The multilayer film is at least partially relatively reflective to radiation having a wavelength of less than 70 nanometers.
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| 申请公布号 |
US6869734(B1) |
申请公布日期 |
2005.03.22 |
| 申请号 |
US20020331681 |
申请日期 |
2002.12.30 |
| 申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
LYONS CHRISTOPHER F.;TABERY CYRUS E.;HUANG RICHARD J. |
| 分类号 |
G03F1/14;G03F9/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/14 |
| 代理机构 |
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