发明名称 |
Spatially controlled, in situ synthesis of polymers |
摘要 |
An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.
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申请公布号 |
US6869983(B2) |
申请公布日期 |
2005.03.22 |
申请号 |
US20030458344 |
申请日期 |
2003.06.10 |
申请人 |
THE UNIVERSITY OF CHICAGO |
发明人 |
CANEBA GERARD T.;TIRUMALA VIJAYA RAGHAVAN;MANCINI DERRICK C.;WANG HSIEN-HAU |
分类号 |
C08F2/46;(IPC1-7):C08F2/46 |
主分类号 |
C08F2/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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