| 摘要 |
A vacuum pump of an exhaust apparatus in semiconductor equipment is provided to prevent polymers from being adsorbed on a gas discharging port due to the exhaust of residual gas by keeping the temperature of the gas discharging port in a predetermined temperature range. A vacuum pump of an exhaust apparatus includes a cylindrical pump housing(10), a pump housing base(20) with a cooling water hole and a gas discharging port, a motor(30) vertically connected with the center of the pump housing base, a rotor(40), a stator(50), a temperature detecting part, a heating part, a cooling water controlling part, and a controller. The temperature detecting part(60) is installed on the pump housing base to detect the temperature of the pump housing base. The heating part(70) is embedded in the pump housing base along a main surface. The cooling water controlling part(80) is used for controlling the flow rate of a cooling water in the cooling water hole of the pump housing base. The controller(90) is used for controlling the heating part and the cooling water controlling part according to the temperature detected by the temperature detecting part.
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