PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

摘要

A plasma source (1) is composed of a chamber (2) to which a gas is supplied and a hollow cathode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas flows. In such a plasma source (1), a microcathode plasma discharge can occur within the electrode holes (3) of the hollow cathode member (4).