| 发明名称 |
Alignment stage apparatus, exposure apparatus, and semiconductor device manufacturing method |
| 摘要 |
An alignment stage apparatus includes a linear motor including a plurality of coils to drive a stage, and a coil selector which selectively energizes the plurality of coils. The linear motor and coil selector are arranged in a vacuum chamber.
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| 申请公布号 |
US2005052143(A1) |
申请公布日期 |
2005.03.10 |
| 申请号 |
US20040924977 |
申请日期 |
2004.08.25 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
OHISHI SHINJI |
| 分类号 |
H01L21/027;G03F7/20;H02K5/124;H02K9/19;H02K11/04;H02K41/02;H02P25/06;(IPC1-7):H02K41/00;H02P3/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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