发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the bias effect of a substrate in an SGT or S-SGT. SOLUTION: A semiconductor device includes a memory cell having a semiconductor substrate, a first-conductivity columnar semiconductor layer formed on the semiconductor substrate, second-conductivity source and drain diffusion layers formed in the upper and lower parts of the semiconductor layer, and gate electrodes formed on the side faces of the semiconductor layer through gate insulating films. The semiconductor device is also provided with a second-conductivity semiconductor layer and an insulator or cavity in the columnar semiconductor layer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005064031(A) 申请公布日期 2005.03.10
申请号 JP20030207340 申请日期 2003.08.12
申请人 MASUOKA FUJIO;SHARP CORP 发明人 MASUOKA FUJIO;HORII SHINJI;TANIGAMI TAKUJI;YOKOYAMA TAKASHI;TAKEUCHI NOBORU
分类号 H01L27/108;H01L21/265;H01L21/28;H01L21/336;H01L21/8247;H01L27/115;H01L29/06;H01L29/423;H01L29/78;H01L29/786;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L27/108
代理机构 代理人
主权项
地址
您可能感兴趣的专利