| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device capable of fixing without strongly pulling the pattern of a mask especially having no beams in an unmagnified mask used by an electron beam type exposure system. <P>SOLUTION: The unmagnified mask and a wafer are arranged to be vertical, thus totally preventing the pattern of the unmagnified mask from being bent and dispensing with strongly pulling the pattern even in the mask especially having no beams. Besides, a gap between the mask and the wafer can be reduced. There is no need for strongly pulling the pattern of a stencil mask, thus pasting an extremely thin membrane to the pattern. As a result, a mask called as a membrane mask can be utilized even if the acceleration voltage of electron beams is low, for example few kV, and pattern can be formed by a single exposure even in a doughnut-shaped pattern. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
