| 摘要 |
PROBLEM TO BE SOLVED: To suppress re-adhesion of pollutants adhering to a cleaned silicon substrate or the like. SOLUTION: A cleaned material treated by an ordinary acid and alkali is treated by a process 1 of oxidation and ultrasonic cleaning in an oxidation colloid, a process 2 of valence conversion in an oxidation colloid, a process 3 of complete dissolution of an element to be converted in a reduction colloid, a process 4 of valence conversion in a reduction colloid, a process 5 of dissolution of the valence converted element in a reduction colloid and a process 6 of finishing dissolution for preventing pollutants and microorganisms from re-adhering, in a cleaning system provided with an ultrapure water preparing device 7, an oxidation-colloid preparing device 8 and a reduction-colloid preparing device 9. COPYRIGHT: (C)2005,JPO&NCIPI
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