发明名称 Herstellungsverfahren für ein Halbleiterbauelement
摘要 <p>A semiconductor wafer, a semiconductor device, and a method of manufacturing the semiconductor device which prevent corrosion of pads in a semiconductor integrated circuit. A semiconductor wafer having semiconductor integrated circuits and interconnections extending from wire-bonding pads on the semiconductor integrated circuits to a dicing line is cut along the dicing line into chips. Part of the interconnections are left on the chips as wafer testing pad remainders, and the surfaces of the wafer testing pad remainders are covered with an insulating film, preventing the invasion of water from the wafer testing pad remainders and corrosion of the wire-bonding pads in the semiconductor integrated circuit, improving reliability and durability of the semiconductor device.</p>
申请公布号 DE19645568(B4) 申请公布日期 2005.03.03
申请号 DE1996145568 申请日期 1996.11.05
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO 发明人 NAKAMURA, KAZUKO
分类号 H01L21/66;H01L21/301;H01L21/60;H01L21/78;H01L23/485;(IPC1-7):H01L27/04;H01L21/76 主分类号 H01L21/66
代理机构 代理人
主权项
地址
您可能感兴趣的专利