SEMICONDUCTOR FABRICATION APPARATUS HAVING IMPROVED BAFFLE ARRAY STRUCTURE TO PREVENT CHANGE OF INSTALLATION POSITIONS OF UPPER BAFFLE AND LOWER BAFFLE

摘要

PURPOSE: A semiconductor fabrication apparatus having an improved baffle array structure is provided to prevent a change of installation positions of an upper baffle and a lower baffle by using a guide unit. CONSTITUTION: A lower electrode(13) is installed in the inside of a process chamber(10). A wafer is loaded on an upper surface of the lower electrode. A chamber lid(20) is installed at an upper side of the process chamber and includes a gas injection tube for supplying a process gas. An upper electrode(30) is installed at a lower side of the chamber lid. A plurality of injection holes are formed at an edge part and a center part of the upper electrode. An upper baffle(41) is installed at an upper side of the upper electrode and includes a plurality of first injection holes. A lower baffle(45) is installed at a lower side of the upper baffle and includes a plurality of second injection holes. A guide unit(50) is installed between the upper baffle and the lower baffle.